Taoyuan, Taiwan

Shun-Te Lin

This inventor holds 1 USPTO granted patent. Top assignee: Everlight USA, Inc.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shun-Te Lin. Retrieved from https://idiyas.com/inventor/shun-te-lin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Shun-Te Lin: Innovator in Black Ink Composition

Introduction

Shun-Te Lin is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of ink technology, particularly with his innovative black ink composition. His work is characterized by a focus on quality and compatibility, which has implications for various printing applications.

Latest Patents

Shun-Te Lin holds a patent for a black ink composition. This composition includes a dispersive black colorant, less than 1 wt % of a glycol ether compound based on the total weight of the black ink composition, a solvent, and water. Notably, this black ink composition is free of surfactants, which enhances its compatibility with nozzles. As a result, it provides excellent smoothness in printing and produces high-quality images.

Career Highlights

Shun-Te Lin is currently associated with Everlight USA, Inc., where he continues to develop innovative solutions in ink technology. His expertise and dedication to quality have positioned him as a valuable asset in his field.

Collaborations

Shun-Te Lin has collaborated with several talented individuals, including Chien-Ming Chen and Chien-Wen Lee. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Shun-Te Lin's contributions to the field of ink composition exemplify the importance of innovation in enhancing product quality. His work not only advances technology but also sets a standard for future developments in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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