Kyoto, Japan

Shun Tanaka

This inventor holds 1 USPTO granted patent. Top assignee: Nissha Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shun Tanaka. Retrieved from https://idiyas.com/inventor/shun-tanaka-kdyy6v4e

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Shun Tanaka: Innovator in Display Technology

Introduction

Shun Tanaka is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of display technology, particularly through his innovative patent that enhances the functionality and aesthetics of display devices.

Latest Patents

Shun Tanaka holds a patent for a "Display device and method for manufacturing display device." This invention involves a light guide member with a first groove formed in its main surface. The decorative layer molded with the light guide member includes two light-emitting portions that radiate visible light from separate light-emitting elements. The design strategically positions a first light-absorbing member to block optical paths, enhancing the display's performance and visual appeal. He has 1 patent to his name.

Career Highlights

Tanaka is currently employed at Nissha Co., Ltd., a company known for its advancements in printing and display technologies. His work at Nissha has allowed him to focus on developing innovative solutions that meet the evolving needs of the display industry.

Collaborations

One of his notable collaborators is Masaru Terashita, with whom he has worked closely to advance their projects in display technology.

Conclusion

Shun Tanaka's contributions to display technology through his innovative patent demonstrate his commitment to enhancing visual experiences. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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