Tokyo, Japan

Shun Kizawa

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Hitachi High-Tech Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shun Kizawa. Retrieved from https://idiyas.com/inventor/shun-kizawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Shun Kizawa: Inventor in Electron Beam Inspection Technology.

Introduction

Shun Kizawa is an inventor based in Tokyo, Japan, and works at Hitachi High-Tech Corporation. His patent work includes technology for electron beam application and sample inspection.

Latest Patents

Kizawa is associated with 1 patent: “Electron Beam Application Apparatus and Inspection Method.” The invention describes an apparatus that uses excitation light to illuminate a sample and an electron optical system to project a photoelectron image onto a camera. A pattern-forming unit can create a bright-and-dark optical pattern on the sample when switched on, or illuminate the sample without that pattern when switched off. A control unit uses feature data from the patterned photoelectron image to adjust the electron optical system.

Career Highlights

Kizawa’s patent reflects work on coordinating optical illumination and electron imaging to support inspection. His listed employer, Hitachi High-Tech Corporation, develops technologies and equipment for scientific and industrial applications.

Collaborations

Kizawa’s listed coworker is Momoyo Enyama. The available information identifies their workplace but does not specify a particular joint project.

Conclusion

Shun Kizawa’s patent focuses on using patterned excitation light and photoelectron imaging to adjust an electron optical system for sample inspection.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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