Shun-Jung Chen

Title: Shun-Jung Chen: Innovator in Lithographic Processes

Introduction

Shun-Jung Chen is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in lithographic processes. His innovative approach has led to the development of a patented method that enhances the efficiency and accuracy of semiconductor wafer processing.

Latest Patents

Shun-Jung Chen holds a patent for a "Method for lithographic process and lithographic system." This method involves a series of steps for performing a lithographic process over a semiconductor wafer. It includes coating a photoresist layer over a material layer formed on the semiconductor wafer in a track apparatus. The process further entails transferring the semiconductor wafer from the track apparatus to an exposure apparatus. Additionally, it involves measuring the height of the photoresist layer before removing the semiconductor wafer from the track apparatus and determining a focal length for exposing the semiconductor wafer based on the heights of both layers. This innovation is crucial for improving the precision of semiconductor manufacturing.

Career Highlights

Shun-Jung Chen is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in semiconductor technology.

Collaborations

Shun-Jung Chen has collaborated with notable colleagues such as Wei-Chih Lai and Li-Kai Cheng. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas within the semiconductor field.

Conclusion

Shun-Jung Chen's contributions to lithographic processes have made a significant impact on semiconductor manufacturing. His patented methods demonstrate his commitment to innovation and excellence in the industry.