Taoyuan, Taiwan

Shun-Hsiang Ke

This inventor holds 1 USPTO granted patent. Top assignee: Optimax Technology Corporation. Active years: 2005.


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Innovations of Shun-Hsiang Ke in Anti-Glaring and Anti-Reflecting Film Technology

Introduction

Shun-Hsiang Ke is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of optical technology, particularly in the development of anti-glaring and anti-reflecting films. His innovative approach simplifies the manufacturing process while enhancing the performance of these films.

Latest Patents

Shun-Hsiang Ke holds a patent for a "Method for forming anti-glaring and anti-reflecting film." This invention discloses a method that allows for the production of an anti-glaring and anti-reflecting film through a single coating process. The design not only simplifies the manufacturing process but also improves the yield of the final product. Additionally, the film incorporates features such as anti-fouling and hard-coating, making it a more robust solution in optical applications.

Career Highlights

Shun-Hsiang Ke is associated with Optimax Technology Corporation, where he applies his expertise in optical technologies. His work has been instrumental in advancing the capabilities of anti-glaring and anti-reflecting films, contributing to the company's reputation in the industry.

Collaborations

Shun-Hsiang Ke has collaborated with talented individuals such as Ta-Wang Lai and Feng-Yu Huang. These partnerships have fostered innovation and have been crucial in the development of new technologies in their field.

Conclusion

Shun-Hsiang Ke's contributions to the field of optical technology, particularly through his patented method for anti-glaring and anti-reflecting films, highlight his innovative spirit and dedication to improving manufacturing processes. His work continues to influence advancements in optical applications.

Profile summary based on public USPTO records.
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