Sendai, Japan

Shun Chihara

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Japan Science and Technology Agency. Active years: 2020-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shun Chihara. Retrieved from https://idiyas.com/inventor/shun-chihara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2020-2021

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2 patents (USPTO):Explore Patents

Title: Shun Chihara: Innovator in Adhesive Hydrogel Technology

Introduction

Shun Chihara is a notable inventor based in Sendai, Japan. He has made significant contributions to the field of adhesive hydrogels, with a focus on innovative materials that enhance adhesion properties. His work is characterized by a commitment to advancing technology in this specialized area.

Latest Patents

Chihara holds 2 patents related to catechol-containing adhesive hydrogels. His latest patents include a hydrogel that adheres to the surface of materials, utilizing a combination of a water-soluble main chain monomer, crosslinking agent, polymerization initiator, and an adhesive monomer featuring at least a catechol group in its side chain. This innovative approach provides a versatile solution for various applications requiring strong adhesion.

Career Highlights

Chihara is affiliated with the Japan Science and Technology Agency, where he continues to explore and develop new adhesive technologies. His research has positioned him as a key figure in the advancement of hydrogel applications in various industries.

Collaborations

Chihara has collaborated with esteemed colleagues such as Hiroshi Yabu and Matsuhiko Nishizawa. These partnerships have fostered a collaborative environment that enhances the research and development of adhesive technologies.

Conclusion

Shun Chihara's work in adhesive hydrogel technology exemplifies innovation and dedication to improving material properties. His contributions are paving the way for future advancements in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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