This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Toshiba Ceramics Co., Ltd.. Active years: 1998.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1998
Title: Innovations in Silicon Wafer Manufacturing: The Contributions of Shuji Tobashi
Introduction: Shuji Tobashi, an innovative inventor located in Kanagawa, Japan, has made significant strides in the field of silicon wafer manufacturing. His dedication to advancing technology is evidenced by his patented method that eliminates the need for final mirror-polishing, thereby improving manufacturing efficiency and product quality.
Latest Patents: Shuji Tobashi holds a notable patent for a method of silicon wafer manufacturing that focuses on achieving specific surface roughness parameters. The process involves mirror-polishing the silicon wafer to obtain surface roughness values of Ra ranging from 0.70-1.00 nm, Rq from 0.80-1.10 nm, or Rt from 4.50-7.00 nm. The wafer is then subjected to heat treatment in a hydrogen gas atmosphere at temperatures not lower than 1,200 degrees Celsius for a duration between 30 minutes to 4 hours. Additionally, another aspect of his patent details a silicon wafer mirror-polishing method aimed at achieving even finer roughness, resulting in Ra values between 0.08-0.70 nm and rms values from 0.10-0.90 nm in specified areas.
Career Highlights: Shuji Tobashi is currently associated with Toshiba Ceramics Co., Ltd., where he leverages his expertise in semiconductor manufacturing. His innovations are not only pivotal in enhancing manufacturing processes but also in potentially impacting various applications in electronics and materials science.
Collaborations: Throughout his career, Tobashi has collaborated with notable colleagues, including Hiroshi Shirai and Jun Yoshikawa. These partnerships reflect a strong teamwork approach, fostering collective innovation and progressing the field of materials technology.
Conclusion: Shuji Tobashi’s contributions to silicon wafer manufacturing underscore his role as a key figure in the technology sector. Through his innovative patent and collaborative efforts, he continues to influence advancements in semiconductor technology, paving the way for future innovations in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile