Shuiyuan Luo

Title: Innovations by Inventor Shuiyuan Luo

Introduction

Shuiyuan Luo is a notable inventor based in Newark, DE, recognized for his innovative contributions to the field of semiconductor, optical, and magnetic substrate polishing. With a total of four patents to his name, Luo has established a reputation for developing cutting-edge technologies that enhance the efficiency and effectiveness of polishing processes used in various industries.

Latest Patents

Two of Shuiyuan Luo's latest patents showcase his inventive prowess in improving polishing pads. The first patent, titled "Low-defect-porous polishing pad," describes a polishing pad designed to optimize the polishing or planarizing of semiconductor, optical, and magnetic substrates. It features an open-cell polymeric matrix and a unique structure that enhances debris removal while reducing polishing dwell time. This innovative design includes a series of grooves and tapered support structures that significantly improve the polishing process.

The second patent, "Tapering method for poromeric polishing pad," details a method for creating a porous polyurethane polishing pad. This method involves coagulating thermoplastic polyurethane to form a structured porous matrix with interconnected pores. By utilizing controlled heating, Luo achieves intricate pillow-like structures that improve polishing performance, illustrating his commitment to advancing polishing technologies.

Career Highlights

Shuiyuan Luo's career has been marked by his work at Rohm and Haas Electronic Materials CMP Holdings, Inc., where he has made significant advancements in polishing technology. His contributions reflect a dedicated focus on improving product efficiency and functionality, emphasizing his status as a leading inventor in his field.

Collaborations

Throughout his career, Luo has collaborated with esteemed colleagues such as Henry Sanford-Crane and Koichi Yoshida. These collaborations have enabled him to share knowledge and combine expertise, fostering an environment of innovation and leading to the development of impactful technologies.

Conclusion

With a strong portfolio of patents and a history of successful collaborations, Shuiyuan Luo exemplifies the spirit of innovation. His work in developing effective polishing solutions continues to influence the semiconductor and optical industries, highlighting the critical role inventors play in driving technological advancement.