Otake, Japan

Shuhei Otsuka

This inventor holds 2 USPTO granted patents. Top assignees: Mitsubishi Chemical Corporation, Mitsubishi Rayon Company, Limited. Active years: 2004-2018.


% Patents Active = 100.0

Average Co-Inventor Count = 2.4

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2004-2018

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2 patents (USPTO):Explore Patents

Title: Shuhei Otsuka: Innovator in Chemical Engineering

Introduction

Shuhei Otsuka is a notable inventor based in Otake, Japan. He has made significant contributions to the field of chemical engineering, particularly in the development of innovative processes and equipment. With a total of 2 patents, Otsuka's work has had a meaningful impact on the industry.

Latest Patents

Otsuka's latest patents include a vertical centrifugal thin film evaporator and a monomer purification method. The vertical centrifugal thin film evaporator features a cylindrical body oriented vertically, a rotor that rotates within the body, and a wiper that slides along the inner surface. This design prevents liquid from being retained between the wiper and the fixing support, enhancing efficiency. The monomer purification method involves a process for producing methyl methacrylate through direct esterification of methacrolein and methanol, followed by distillation to recover methanol.

Career Highlights

Throughout his career, Shuhei Otsuka has worked with prominent companies such as Mitsubishi Rayon Company, Limited and Mitsubishi Chemical Corporation. His experience in these organizations has allowed him to refine his skills and contribute to various innovative projects.

Collaborations

Otsuka has collaborated with notable coworkers, including Akio Munetou and Hideyasu Takezawa. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Shuhei Otsuka's contributions to chemical engineering through his patents and collaborations highlight his role as an influential inventor. His innovative approaches continue to shape the industry and inspire future advancements.

Profile summary based on public USPTO records.
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