Tsukuba, Japan

Shuhei Namekawa

This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shuhei Namekawa. Retrieved from https://idiyas.com/inventor/shuhei-namekawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:

goldMedal1 out of 834,570 
Other
 patents

Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: The Innovations of Shuhei Namekawa

Introduction: Shuhei Namekawa is a notable inventor based in Tsukuba, Japan. He has made significant contributions to the field of polymer science, particularly with his innovative work on copolymers. His dedication to research and development has led to the creation of a unique patent that showcases his expertise.

Latest Patents: Shuhei Namekawa holds a patent for a (2,5-disubstituted-1,4-phenylene oxide) block or graft copolymer. This invention represents a significant advancement in the field of materials science, offering potential applications in various industries.

Career Highlights: Throughout his career, Shuhei has demonstrated a strong commitment to innovation. His work has not only contributed to the scientific community but has also paved the way for future advancements in polymer technology. With a total of 1 patent, he continues to be an influential figure in his field.

Collaborations: Shuhei has collaborated with esteemed colleagues such as Hideyuki Higashimura and Shiro Kobayashi. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and enhances the quality of their research.

Conclusion: Shuhei Namekawa's contributions to the field of polymer science are commendable. His innovative spirit and collaborative efforts with fellow researchers highlight the importance of teamwork in achieving scientific breakthroughs. His work continues to inspire future generations of inventors and researchers.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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