Koshi, Japan

Shuhei Goto


Average Co-Inventor Count = 2.8

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2021-2025

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3 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Shuhei Goto

Introduction

Shuhei Goto is a prominent inventor based in Koshi, Japan. He has made significant contributions to the field of substrate processing technology. With a total of 3 patents to his name, Goto's work has advanced the efficiency and effectiveness of substrate processing systems.

Latest Patents

One of Goto's latest patents is a substrate processing apparatus and substrate processing method. This invention includes a controller configured to perform a first recipe and a second recipe in parallel. Each recipe involves a series of processes, including transferring a substrate from a transit unit to a liquid processing unit, liquid processing, and drying processing. The controller determines the optimal timing for these processes to ensure that they do not overlap, thereby enhancing efficiency.

Another notable patent is a substrate processing system that features a carry-in/out unit for cassettes accommodating multiple substrates. This system includes both batch processing and single-wafer processing units, allowing for flexible and efficient substrate handling. The design incorporates interface units that facilitate the transfer of substrates between processing units, further optimizing the workflow.

Career Highlights

Shuhei Goto is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at this esteemed organization has allowed him to develop innovative solutions that address the challenges faced in substrate processing.

Collaborations

Throughout his career, Goto has collaborated with talented individuals such as Tomohiro Kaneko and Takafumi Tsuchiya. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies in the field.

Conclusion

Shuhei Goto's contributions to substrate processing technology exemplify the impact of innovation in the semiconductor industry. His patents reflect a commitment to enhancing processing efficiency and effectiveness. Goto's work continues to influence the field, paving the way for future advancements.

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