Taoyuan, Taiwan

Shuen-Chang Hung

This inventor holds 2 USPTO granted patents. Top assignee: Cyntec Company. Active years: 2022-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shuen-Chang Hung. Retrieved from https://idiyas.com/inventor/shuen-chang-hung

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2022-2024

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2 patents (USPTO):Explore Patents

Title: Innovations by Shuen-Chang Hung

Introduction

Shuen-Chang Hung is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of electronic devices, holding a total of 2 patents. His work focuses on enhancing the efficiency and performance of inductors through innovative shielding techniques.

Latest Patents

Shuen-Chang Hung's latest patents include an electronic device and the method to make the same. This invention features a shielding layer made of conductive and magnetic material, which encapsulates the bare metal wire of a coil of an inductor. This design effectively shields the coil from external magnetic fields, resulting in lower resistance and power loss for the inductor. The innovative approach aims to improve the overall performance of electronic devices.

Career Highlights

Shuen-Chang Hung is currently employed at Cyntec Company, where he continues to develop cutting-edge technologies in the electronics sector. His expertise in the field has led to advancements that benefit various applications in electronic devices.

Collaborations

Shuen-Chang collaborates with Min-Feng Chung, working together to push the boundaries of innovation in their projects.

Conclusion

Shuen-Chang Hung's contributions to the field of electronics through his patents and work at Cyntec Company highlight his role as a significant inventor. His innovative approaches continue to influence the development of more efficient electronic devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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