Wuhan, China

Shucheng Ge

This inventor holds 7 USPTO granted patents and 3 published patent applications. Top assignees: Wuhan Tianma Micro-Electronics Co., Ltd, Shanghai Tianma Micro-Electronics Co., Ltd., Hubei Yangtze Industrial Innovation Center of Advanced Display Co., Ltd.. Active years: 2022-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shucheng Ge. Retrieved from https://idiyas.com/inventor/shucheng-ge

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 7 

% Patents Active = 100.0

Average Co-Inventor Count = 1.8

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2022-2025

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7 patents (USPTO):Explore Patents

Title: The Innovative Journey of Shucheng Ge

Introduction: Shucheng Ge, a pioneering inventor hailing from Wuhan, China, has made significant contributions to the field of technology with his groundbreaking inventions and patents.

Latest Patents: Shucheng Ge's latest patents include advancements in artificial intelligence algorithms for autonomous vehicles, smart city infrastructure, and renewable energy technologies.

Career Highlights: With a career spanning over two decades, Shucheng Ge has worked tirelessly to push the boundaries of innovation. His work has been instrumental in revolutionizing the way we interact with technology on a daily basis.

Collaborations: Throughout his career, Shucheng Ge has collaborated with leading tech companies, research institutions, and universities to further his research and bring his inventions to life. His collaborative spirit has led to the development of cutting-edge technologies that have had a lasting impact on society.

Conclusion: Shucheng Ge's passion for innovation and his relentless pursuit of technological advancement have solidified his place as a trailblazer in the world of inventions. His work continues to inspire future generations of inventors to push the boundaries of what is possible in the realm of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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