Company Filing History:
Years Active: 2020
Title: Shubin Su: Innovator in Graphene Film Patterning
Introduction
Shubin Su is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of materials science, particularly in the area of graphene technology. His innovative work focuses on the patterning of graphene films, which has important implications for various applications in electronics and nanotechnology.
Latest Patents
Shubin Su holds a patent for a method titled "Method for implementing and regulating patterning of a graphene film by ultraviolet photo-oxidation." This patent outlines a novel approach that includes several key steps. Firstly, it describes the implementation of patterning a graphene film micron structure using a xenon lamp excimer ultraviolet photo-oxidation vacuum apparatus and a hard mask. Secondly, it involves controlling oxygen excitons by applying a non-uniform magnetic field on the surface of the graphene film in a vertical direction. This technique enhances the directivity of etching to the graphene film, thereby improving the quality of the patterning. Lastly, the method allows for the adjustment of the intensity and direction of the magnetic field, which controls the movement of the oxygen excitons and the shape of the etched pattern structure.
Career Highlights
Shubin Su is affiliated with Shanghai Jiao Tong University, where he continues to advance research in graphene technologies. His work has garnered attention for its innovative approach and potential applications in various high-tech fields. With a focus on enhancing the quality and precision of graphene film patterning, Su's contributions are paving the way for future advancements in material sciences.
Collaborations
Shubin Su has collaborated with notable colleagues, including Haihua Tao and Xianfeng Chen. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas in the field of graphene research.
Conclusion
Shubin Su's work in the patterning of graphene films represents a significant advancement in materials science. His innovative methods and collaborations are contributing to the ongoing development of graphene technology, which holds great promise for the future.