Shuai Su

Title: Innovations of Shuai Su in Semiconductor Technology

Introduction

Shuai Su is a notable inventor based in Suzhou, China. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent. His work focuses on enhancing the manufacturing processes of semiconductor devices, which are crucial for modern electronics.

Latest Patents

Shuai Su holds a patent for a semiconductor device and manufacturing method that employs an etching transition layer. This patent outlines a method that involves creating a semiconductor material layer with two laminated semiconductor layers, separated by an etching transition layer. The process includes etching a portion of one semiconductor layer until it reaches the etching transition layer. This method allows for precise control over the depth of the trench etched into the semiconductor material, effectively preventing surface damage and ensuring that the electrical characteristics of the device remain stable.

Career Highlights

Shuai Su is affiliated with the Chinese Academy of Sciences, where he conducts research and development in semiconductor technologies. His innovative approach to manufacturing methods has positioned him as a key figure in the advancement of semiconductor devices.

Collaborations

Shuai Su collaborates with esteemed colleagues such as Qian Sun and Yu Chen Zhou. Their combined expertise contributes to the ongoing research and development efforts within the semiconductor field.

Conclusion

Shuai Su's contributions to semiconductor technology through his innovative patent demonstrate his commitment to advancing the field. His work not only enhances manufacturing processes but also ensures the reliability of semiconductor devices in various applications.