Company Filing History:
Years Active: 2020-2024
Title: Innovations of Shu-Yen Liu
Introduction
Shu-Yen Liu is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of optical proximity correction, holding a total of 2 patents. His work focuses on enhancing photomask layouts, which are crucial in semiconductor manufacturing.
Latest Patents
Shu-Yen Liu's latest patents include an optical proximity correction device and method. This device comprises an analysis unit, a reverse pattern addition unit, a first OPC unit, a second OPC unit, and an output unit. The analysis unit is designed to analyze defect patterns from photomask layouts. The reverse pattern addition unit provides a reverse pattern within the defect pattern. The first OPC unit performs a first OPC procedure on the entire photomask layout, while the second OPC unit enhances the exposure tolerance window of the defect pattern. The output unit then produces the corrected photomask layout. Another patent involves a photomask that includes a substrate with defined regions and a patterned layer, ensuring specific thickness variations between different patterned layers.
Career Highlights
Shu-Yen Liu is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work has been instrumental in advancing technologies related to photomasks and optical proximity correction.
Collaborations
Some of his notable coworkers include Hui-Fang Kuo and Chian-Ting Huang, who have collaborated with him on various projects within the company.
Conclusion
Shu-Yen Liu's contributions to optical proximity correction and photomask technology highlight his innovative spirit and dedication to advancing the semiconductor field. His patents reflect a commitment to improving manufacturing processes and enhancing product quality.