Miaoli, Taiwan

Shu-Wei Hsu

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Innolux Corporation. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shu-Wei Hsu. Retrieved from https://idiyas.com/inventor/shu-wei-hsu-mse9qn3m

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Shu-Wei Hsu: Inventor in Electronic Display Design

Introduction

Shu-Wei Hsu is an inventor based in Miaoli, Taiwan. His work includes an electronic-device design intended to reduce the border edge occupied by non-display areas.

Latest Patents

Hsu is associated with 1 patent: “Electronic Device for Reducing a Border Edge of the Non-Display Areas.” The invention describes an electronic device with adjacent first and second signal lines. A section of each line extends in a different direction, and, when viewed from above, the sections cross. This arrangement addresses the design of non-display areas along an electronic device’s border.

Career Highlights

Hsu works at Innolux Corporation, a company involved in display technology. His patent reflects an engineering focus on signal-line layout and reducing the border area required around a display.

Collaborations

Hsu’s listed coworkers include Ming-Chun Tseng and Yi-Hua Hsu. Their shared association with Innolux Corporation provides professional context for his work.

Conclusion

Shu-Wei Hsu’s patent documents a signal-line arrangement designed to help reduce non-display border space, highlighting his contribution to electronic-device design.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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