Company Filing History:
Years Active: 2007
Title: The Innovations of Shu W Wang
Introduction
Shu W Wang is a notable inventor based in Rochester, NY (US). He has made significant contributions to the field of measurement technology, particularly in the non-contact measurement of wafer thickness. With a total of 2 patents to his name, his work has advanced the precision and efficiency of thickness measurement systems.
Latest Patents
Wang's latest patents include a method and apparatus for measuring wafer thickness. This innovative system utilizes a laser beam that is split into two identical directly opposed input beams. A calibration object of known thickness reflects these beams from the sides of the test object. Each reflected beam passes through sensing means, including a pinhole aperture and a photodiode sensor. The maximum sensor output defines the first and second focal points, which are a known distance apart. By determining the deviation of the positions of the test object reflecting surfaces from the calibration object surfaces, the thickness of the test object can be accurately determined.
Another patent by Wang also focuses on a system for non-contact measurement of thickness. In this method, a laser beam is again split into two identical input beams. A calibration object reflects these beams, and the focus is locked to generate focus error data for each beam. After removing the calibration object, the test object is inserted into the path of the focused input beams, allowing for the accurate determination of the test object's thickness.
Career Highlights
Shu W Wang is currently employed at Chapman Instruments, Inc. His work at this company has been pivotal in developing advanced measurement technologies. His innovative approaches have not only enhanced the accuracy of measurements but have also contributed to the efficiency of various industrial processes.
Collaborations
Wang has collaborated with notable colleagues such as Thomas C Bristow and John E Stephan. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in measurement systems.
Conclusion
Shu W Wang's contributions to the field of measurement technology are significant and impactful. His innovative patents and collaborative efforts continue to advance the precision of non-contact measurement systems. His work exemplifies the importance of innovation in enhancing industrial processes and technology.