Company Filing History:
Years Active: 1988
Title: The Innovations of Shu Nakajima
Introduction
Shu Nakajima is a notable inventor based in Fujisawa, Japan. He has made significant contributions to the field of plasma etching technology. His work has led to advancements that are crucial for various applications in semiconductor manufacturing.
Latest Patents
Shu Nakajima holds a patent for a process and apparatus known as the Xenon enhanced plasma etch. This innovative plasma etch process utilizes a gas mixture that includes CF.sub.3 Br, xenon or krypton, and oxygen. The design of the plasma reactor features a sacrificial element, preferably a graphite ring, positioned on the lower electrode of a parallel plate reactor. This invention enhances the efficiency and effectiveness of plasma etching processes.
Career Highlights
Throughout his career, Shu Nakajima has been associated with Tegal Corporation, where he has played a pivotal role in developing cutting-edge technologies. His expertise in plasma etching has positioned him as a key figure in the industry. His contributions have not only advanced the technology but have also influenced the practices within semiconductor manufacturing.
Collaborations
Shu Nakajima has worked alongside notable colleagues such as Mark M Stark and Roger B Lachenbruch. Their collaborative efforts have furthered the development of innovative solutions in the field of plasma etching.
Conclusion
Shu Nakajima's work exemplifies the spirit of innovation in the semiconductor industry. His patent for the Xenon enhanced plasma etch process showcases his commitment to advancing technology. His contributions continue to impact the field significantly.