This inventor holds 3 USPTO granted patents. Top assignees: Industrial Technology Research Institute, Hiwin Mikrosystem Corporation. Active years: 2011-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:

Years Active: 2011-2025
Title: Innovations of Shu-Chun Liao
Introduction
Shu-Chun Liao is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of technology, particularly in the areas of inspection methods and measuring devices. With a total of 3 patents to his name, Liao's work reflects a commitment to advancing innovation.
Latest Patents
One of Liao's latest patents is an "Inspection method and inspection platform for lithography." This invention provides a method and platform for inspecting a light source used to expose a substrate. The method involves placing inspection components on the substrate's surface and moving them relative to an illuminated area, allowing for the inspection of photon energy and determination of optical values.
Another significant patent is the "Resilience and displacement measuring device and method." This device features a shaft with detection modules at both ends. It measures displacement and resilience by pressing a probe on a tested key while simultaneously measuring the displacement of the shaft. This innovative design allows for precise measurements by dividing the range into sub-ranges and applying specific calculation models.
Career Highlights
Shu-Chun Liao has worked with prominent organizations such as the Industrial Technology Research Institute and Hiwin Mikrosystem Corporation. His experience in these institutions has contributed to his expertise and the development of his patented technologies.
Collaborations
Liao has collaborated with notable colleagues, including Li-Fen Liao and Cheng-Hsien Chen. These partnerships have likely enhanced his research and development efforts.
Conclusion
Shu-Chun Liao's contributions to technology through his patents demonstrate his innovative spirit and dedication to improving measurement and inspection methods. His work continues to influence the field and inspire future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile