Sunnyvale, CA, United States of America

Shreya Dhar

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shreya Dhar. Retrieved from https://idiyas.com/inventor/shreya-dhar

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Shreya Dhar: Innovator in Semiconductor Technology

Introduction

Shreya Dhar is a prominent inventor based in Sunnyvale, CA (US). She has made significant contributions to the field of semiconductor technology. With a focus on innovation, she has developed a patent that showcases her expertise and creativity.

Latest Patents

Shreya holds a patent for a device known as the Purge Shield. This invention is designed to enhance the efficiency and safety of semiconductor manufacturing processes. Her work in this area reflects her commitment to advancing technology in the industry.

Career Highlights

Shreya is currently employed at Applied Materials, Inc., a leading company in the semiconductor sector. Her role involves working on cutting-edge technologies that drive the industry forward. With her innovative mindset, she continues to contribute to the development of new solutions.

Collaborations

Shreya collaborates with talented individuals such as Suraj Suresh Babu and Dhritiman Subha Kashyap. Together, they work on projects that push the boundaries of semiconductor technology. Their teamwork exemplifies the spirit of innovation within the field.

Conclusion

Shreya Dhar is a remarkable inventor whose work in semiconductor technology is paving the way for future advancements. Her patent for the Purge Shield and her role at Applied Materials, Inc. highlight her dedication to innovation. Through her collaborations and contributions, she is making a lasting impact in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…