Niihama, Japan

Shozi Ishikawa

This inventor holds 1 USPTO granted patent. Top assignee: Sumitomo Chemical Company, Limited. Active years: 1981.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shozi Ishikawa. Retrieved from https://idiyas.com/inventor/shozi-ishikawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1981

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1 patent (USPTO):Explore Patents

Title: Shozi Ishikawa: Patent Inventor in Slurry Discharge Technology.

Introduction

Shozi Ishikawa is an inventor associated with Niihama, Japan, and Sumitomo Chemical Company, Limited. His patent work addresses the controlled discharge of polymer-particle slurry.

Latest Patents

The available information lists one patent for Ishikawa: “Method of Discharging Slurry by Varying Valve Openings.” The method aims to discharge slurry containing suspended polymer particles with an average diameter of 0.1 to 1 millimeter while preventing valve clogging. It specifies operating the valve within one opening range for 5 to 60 seconds, followed by another range for 1 to 10 seconds. The first range is one in which discharged polymer particles gradually clog the valve, while the second allows continuous discharge without clogging. Ishikawa is credited with 1 patent.

Career Highlights

Ishikawa’s listed invention focuses on managing valve openings and operating times to improve the reliability of slurry discharge. The available information associates him with Sumitomo Chemical Company, Limited.

Collaborations

Kiyoshi Matsuyama and Seizi Hirata are identified as Ishikawa’s coworkers. The provided information does not specify their roles in the patent.

Conclusion

Shozi Ishikawa’s listed patent presents a timed valve-opening method for discharging polymer-particle slurry while reducing the risk of clogging.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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