Shouyan Huang

Title: Shouyan Huang: Innovator in Overlay Alignment Technology

Introduction

Shouyan Huang is a prominent inventor based in Beijing, China. He has made significant contributions to the field of semiconductor technology, particularly in overlay alignment methods. His innovative work has led to the development of a unique patent that addresses critical challenges in the manufacturing process of patterned wafers.

Latest Patents

Shouyan Huang holds a patent for an "Overlay alignment mark and method for measuring overlay error." This invention provides an overlay alignment mark located in a patterned wafer, which includes a lower-layer pattern in a first layer and an upper-layer pattern in a second layer above the first layer. The overlay alignment mark consists of a first pattern, which is a portion of the lower-layer pattern featuring a pair of solid features formed in the first layer. Additionally, it includes a second pattern, which is a portion of the upper-layer pattern comprising two pairs of hollowed features formed in the second layer. The design ensures that the orthographic projection of the solid features overlaps with the hollowed features, enhancing measurement accuracy.

Career Highlights

Shouyan Huang is currently employed at Zhongke Jingyuan Electron Limited in Beijing, where he continues to advance his research and development efforts. His work focuses on improving the precision of semiconductor manufacturing processes, which is crucial for the advancement of electronic devices.

Collaborations

Shouyan has collaborated with notable colleagues, including Weimin Ma and Chunying Han. Their combined expertise contributes to the innovative environment at Zhongke Jingyuan Electron Limited.

Conclusion

Shouyan Huang's contributions to overlay alignment technology exemplify the importance of innovation in the semiconductor industry. His patent and ongoing work continue to influence advancements in manufacturing processes, ensuring higher precision and efficiency in electronic device production.