Tokyo, Japan

Shoutatsu Sugenoya

This inventor holds 1 USPTO granted patent. Top assignee: Tdk Corporation. Active years: 1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shoutatsu Sugenoya. Retrieved from https://idiyas.com/inventor/shoutatsu-sugenoya

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: Shoutatsu Sugenoya: Innovator in Soft Magnetic Thin Film Technology

Introduction

Shoutatsu Sugenoya is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of soft magnetic thin films. His innovative work has led to advancements that are crucial for various technological applications.

Latest Patents

Sugenoya holds 1 patent for his invention of a soft magnetic thin film. This film is characterized by an atomic ratio composition represented by a specific formula, which enhances its magnetic properties. This invention is pivotal for improving the efficiency of electronic devices.

Career Highlights

Sugenoya is associated with TDK Corporation, a leading company in electronic components and materials. His role at TDK has allowed him to focus on research and development, contributing to the company's reputation for innovation in the electronics industry.

Collaborations

Throughout his career, Sugenoya has collaborated with esteemed colleagues such as Osamu Kohmoto and Yuuichi Satoh. These partnerships have fostered a creative environment that encourages the exchange of ideas and expertise, further enhancing the quality of their work.

Conclusion

Shoutatsu Sugenoya's contributions to the field of soft magnetic thin films exemplify the impact of innovative thinking in technology. His work continues to influence advancements in electronic materials, showcasing the importance of research and collaboration in driving progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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