Hachioji, Japan

Shouichi Uchino

This inventor holds 2 USPTO granted patents. Top assignees: Hitachi, Ltd., Hitachi Chemical Company, Ltd.. Active years: 1991-1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shouichi Uchino. Retrieved from https://idiyas.com/inventor/shouichi-uchino

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.4

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1991-1994

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2 patents (USPTO):Explore Patents

Title: Shouichi Uchino: Innovator in Semiconductor Patterning Technologies

Introduction

Shouichi Uchino is a notable inventor based in Hachioji, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the area of photoresist patterning. With a total of 2 patents, Uchino's work has advanced the methods used in the fabrication of semiconductor devices.

Latest Patents

Uchino's latest patents include a method of forming a positive photoresist pattern utilizing contrast. This invention relates to a method of forming a pattern using a photosensitive film that has bleaching properties, which is used as a contrast-enhancing layer. The photosensitive film comprises an aromatic diazonium salt with extremely high purity content, ensuring that no harmful metals are incorporated during preparation. This innovation allows for the formation of fine patterns of various semiconductor devices with high accuracy.

Another significant patent is the radiation imaging process for the formation of a contrast-enhanced pattern. This patent discloses a radiation-sensitive composition that includes a radiation-sensitive compound, which decreases in absorption of radiation upon irradiation. The composition also features an organic polymer that changes in solubility due to the presence of a decomposition product from the radiation-sensitive compound. This process enables the formation of fine resist patterns of 0.5 µm line-and-space patterns or less, achieving sufficiently high contrast.

Career Highlights

Throughout his career, Shouichi Uchino has worked with prominent companies such as Hitachi, Ltd. and Hitachi Chemical Company, Ltd. His experience in these organizations has contributed to his expertise in semiconductor technologies and innovations.

Collaborations

Uchino has collaborated with notable colleagues, including Michiaki Hashimoto and Takao Iwayanagi. These collaborations have likely enriched his research and development efforts in the semiconductor field.

Conclusion

Shouichi Uchino's contributions to semiconductor patterning technologies through his innovative patents have significantly impacted the industry. His work continues to influence the development of high-accuracy semiconductor devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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