Shouichi Miura

Title: Shouichi Miura: Innovator in Semiconductor Cleaning Technology

Introduction

Shouichi Miura is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the cleaning processes of silicon wafers. His innovative approach has led to advancements that improve efficiency and effectiveness in semiconductor manufacturing.

Latest Patents

Miura holds a patent for an "Apparatus and method for cleaning semiconductor wafers." This invention proposes an improvement in the cleaning treatment of semiconductor silicon wafers. The conventional method of using an aqueous solution of an acid is replaced with a cleaning treatment utilizing temporarily acidic pure water. This pure water is produced electrolytically by applying a DC voltage between an anode and a cathode bonded to the surfaces of a hydrogen-ion exchange membrane. This method allows for acidic cleaning treatment under mild conditions, eliminating issues associated with traditional processes.

Career Highlights

Throughout his career, Miura has worked with several prominent companies, including Pre-Tech Co., Ltd. and Shin-Etsu Handotai Co., Ltd. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Miura has collaborated with notable colleagues such as Yasuyuki Harada and Shigeyoshi Netsu. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas in the semiconductor field.

Conclusion

Shouichi Miura's contributions to semiconductor cleaning technology exemplify the importance of innovation in advancing manufacturing processes. His patented methods represent a significant step forward in improving the efficiency and effectiveness of semiconductor wafer cleaning.