Tokyo, Japan

Shouhei Toyoda

This inventor holds 1 USPTO granted patent. Top assignee: Adeka Corporation. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shouhei Toyoda. Retrieved from https://idiyas.com/inventor/shouhei-toyoda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Shouhei Toyoda: Innovator in Electrolytic Plating Solutions

Introduction

Shouhei Toyoda is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of electrolytic plating solutions. His innovative work has led to the development of a unique additive that enhances the performance of these solutions.

Latest Patents

Shouhei Toyoda holds a patent for an "Additive for electrolytic plating solutions, electrolytic plating solution containing additive for electrolytic plating solutions, and electrolytic plating method using electrolytic plating solution." This invention provides an additive for electrolytic plating solutions, which contains at least one compound represented by specific chemical formulas. The electrolytic plating solution that incorporates this additive improves the overall plating process.

Career Highlights

Shouhei Toyoda is associated with Adeka Corporation, where he has been instrumental in advancing the company's research and development efforts. His work focuses on enhancing the efficiency and effectiveness of electrolytic plating methods.

Collaborations

Shouhei Toyoda has collaborated with notable colleagues, including Takuya Takahashi and Naoki Yamada. Their combined expertise has contributed to the success of various projects within the company.

Conclusion

Shouhei Toyoda's innovative contributions to electrolytic plating solutions demonstrate his commitment to advancing technology in this field. His patent and collaborative efforts highlight the importance of teamwork in achieving significant advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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