Company Filing History:
Years Active: 2003-2005
Title: Shoudeng Liang: Innovator in Photolithography and EUV Mask Technology
Introduction
Shoudeng Liang is a prominent inventor based in Sunnyvale, CA, known for his contributions to the field of photolithography and extreme ultraviolet (EUV) mask technology. With a total of 2 patents, Liang has made significant advancements that enhance the efficiency and effectiveness of lithographic processes.
Latest Patents
Liang's latest patents include a high-performance EUV mask, which addresses the structural and processing requirements of EUV lithography. This innovative mask structure features a mask absorber layer that is anisotropically etched with minimal etch bias at a relatively fast etch rate. It combines this layer with a thin ruthenium layer, effectively eliminating the need for a conventional buffer or cap layer. Another notable patent is related to photolithographic mask fabrication. This method involves detecting defects in a mask blank, which includes a reflector on a substrate. The process calculates a correction for an absorber pattern used in forming an absorber, thereby reducing the effects of any defects on the mask's operation.
Career Highlights
Shoudeng Liang is currently employed at Intel Corporation, where he continues to push the boundaries of innovation in semiconductor manufacturing. His work has been instrumental in developing technologies that are crucial for the advancement of photolithography.
Collaborations
Liang has collaborated with notable colleagues, including Alan R. Stivers and Barry R. Lieberman, contributing to a dynamic environment of innovation and research.
Conclusion
Shoudeng Liang's contributions to the field of photolithography and EUV mask technology highlight his role as a key innovator in the industry. His patents reflect a commitment to advancing technology and improving manufacturing processes.