Shou-Chen Kao

Title: Shou-Chen Kao: Innovator in Nano Technology

Introduction

Shou-Chen Kao is a prominent inventor based in Fremont, CA, known for his significant contributions to the field of nano technology. With a total of 5 patents to his name, Kao has developed innovative processes that enhance the capabilities of modern technology.

Latest Patents

One of his latest patents is the "Single layer resist liftoff process for nano track width." This invention addresses the challenges associated with creating liftoff resists that maintain the required resolution as critical dimensions decrease. By utilizing a combination of ion beam processing and ozone slimming, Kao has successfully formed lift-off patterns with undercuts from a single layer of photoresist. The ion beam process hardens the top portion of the resist, while ozone oxidizes and erodes the lower portion to create the necessary undercut.

Another notable patent is the "Photoresist frame plating method for forming planarized magnetic pole layer." This method involves providing a read-write element on a wafer that includes at least one magnetoresistive stripe. A shared pole layer is then positioned above the magnetoresistive stripe and planarized, followed by the formation of a top pole layer. This innovative approach results in a flat gap portion between the shared and top pole layers, leading to improved recording density.

Career Highlights

Throughout his career, Shou-Chen Kao has worked with several notable companies, including Headway Technologies, Incorporated and Applied Materials, Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in technology.

Collaborations

Kao has collaborated with esteemed colleagues such as Jei-Wei Chang and Cherng-Chyi Han. These partnerships have fostered an environment of innovation and creativity, further enhancing the impact of his work.

Conclusion

Shou-Chen Kao's contributions to nano technology through his patents and collaborations highlight his role as a leading inventor in the field. His innovative approaches continue to push the boundaries of technology, paving the way for future advancements.