Yokosuka, Japan

Shota Ohno

This inventor holds 1 USPTO granted patent. Top assignee: Sumitomo Heavy Industries, Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shota Ohno. Retrieved from https://idiyas.com/inventor/shota-ohno

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Shota Ohno: Innovator in Display Technology

Introduction

Shota Ohno is a prominent inventor based in Yokosuka, Japan. He has made significant contributions to the field of display technology, showcasing his innovative spirit through his patented inventions.

Latest Patents

Shota Ohno holds a patent for a display device, evaluation method, and evaluation system. This invention includes a display device featuring a display screen, where multiple evaluation models can be displayed in a selectable manner within a first display area. The evaluation results of evaluation data, obtained using a selected first evaluation model, are displayed in a second area, while results from a selected second evaluation model are shown in a third area. This innovative approach enhances the usability and functionality of display devices.

Career Highlights

Shota Ohno is currently employed at Sumitomo Heavy Industries, Ltd., where he continues to develop cutting-edge technologies. His work has positioned him as a key player in the advancement of display systems.

Collaborations

Throughout his career, Shota has collaborated with notable colleagues, including Masanori Kadowaki and Yutaka Akedo. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Shota Ohno's contributions to display technology exemplify his dedication to innovation. His patented inventions and collaborative efforts continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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