This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Shonal Chouksey: Innovator in Semiconductor Processing
Introduction
Shonal Chouksey is a notable inventor based in Rupnagar, India. He has made significant contributions to the field of semiconductor processing, particularly through his innovative patent.
Latest Patents
Chouksey holds a patent for "Atomic layer deposition using novel oxygen-containing precursors." This patent outlines exemplary methods of semiconductor processing that involve providing a first precursor to a semiconductor processing chamber. A substrate is disposed within the processing region of the chamber, and the first precursor, which includes a first metal, is used to contact the substrate. This process forms a first portion of a metal oxide material on the substrate. The patent further details the use of a second precursor, which is an oxygen-containing compound, to enhance the formation of the metal oxide material.
Career Highlights
Shonal Chouksey is currently employed at Applied Materials, Inc., where he continues to develop innovative solutions in semiconductor technology. His work has been instrumental in advancing the methods used in semiconductor processing.
Collaborations
Chouksey collaborates with various professionals in his field, including his coworker Amit Kumar Roy, to further enhance the impact of his inventions.
Conclusion
Shonal Chouksey's contributions to semiconductor processing through his patent demonstrate his innovative spirit and commitment to advancing technology. His work at Applied Materials, Inc. continues to influence the industry positively.