Osaka, Japan

Shoji Dohi


Average Co-Inventor Count = 6.9

ph-index = 2

Forward Citations = 31(Granted Patents)


Location History:

  • Suita, JP (1992)
  • Osaka, JP (1993 - 1994)

Company Filing History:


Years Active: 1992-1994

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3 patents (USPTO):Explore Patents

Title: Innovations by Inventor Shoji Dohi

Introduction

Shoji Dohi is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of materials science, particularly in the development of far-infrared emitters. With a total of 3 patents to his name, Dohi's work showcases his expertise and innovative spirit.

Latest Patents

Dohi's latest patents include advancements in far-infrared emitters that exhibit high emissivity and corrosion resistance. One of his patents describes a far-infrared emitter prepared by an oxidizing heat treatment of a stainless steel body containing 20-35% by weight of chromium, 0.5-5.0% by weight of molybdenum, and other elements. This process forms an oxidized surface film with a thickness of at least 0.2 mg/cm². Another patent details a method for creating a far-infrared emitter with high emissivity, which involves subjecting a stainless steel body to a blasting treatment followed by an oxidizing heat treatment to form an oxide film with protrusions.

Career Highlights

Throughout his career, Shoji Dohi has worked with prominent companies such as Osaka Gas Company Limited and Kawasaki Steel Corporation. His experience in these organizations has contributed to his development as an inventor and has provided him with valuable insights into the industry.

Collaborations

Dohi has collaborated with notable colleagues, including Akio Nakashiba and Kazuhide Ishii. These partnerships have likely enhanced his innovative capabilities and broadened the scope of his research.

Conclusion

Shoji Dohi's contributions to the field of far-infrared emitters highlight his innovative approach and dedication to advancing materials science. His patents reflect a commitment to developing technologies that improve efficiency and performance in various applications.

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