Kyoto, Japan

Shoichiro Yoshida

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Nitta Haas Inc.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shoichiro Yoshida. Retrieved from https://idiyas.com/inventor/shoichiro-yoshida

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: The Innovations of Shoichiro Yoshida

Introduction

Shoichiro Yoshida is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of polishing compositions, particularly for tungsten-containing metal layers. His innovative approach has led to the development of a unique formulation that enhances the polishing process.

Latest Patents

Yoshida holds a patent for a polishing composition designed specifically for tungsten-containing metal layers formed on insulating layers. This composition includes abrasive grains, one or more halogen acids such as iodic acid, iodous acid, and hypoiodous acid, a strong acid, a hydrogen-ion-supplying agent, and water. This invention showcases his expertise in materials science and chemical engineering.

Career Highlights

Shoichiro Yoshida is currently associated with Nitta Haas Inc., where he continues to innovate and develop new products. His work has been instrumental in advancing polishing technologies, which are crucial in various manufacturing processes.

Collaborations

Yoshida has collaborated with talented individuals such as Koichiro Hosokawa and Yoshiharu Ota. These partnerships have fostered a creative environment that encourages the exchange of ideas and expertise.

Conclusion

In summary, Shoichiro Yoshida is a distinguished inventor whose work in polishing compositions has made a significant impact in the industry. His innovative spirit and collaborative efforts continue to drive advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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