Shoichiro Tonomura

Title: Shoichiro Tonomura: Innovator in Semiconductor Technology

Introduction

Shoichiro Tonomura is a prominent inventor based in Fuji, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His innovative approaches have paved the way for advancements in wiring methods for semiconductor devices.

Latest Patents

One of Tonomura's latest patents focuses on a wiring forming method for semiconductor devices. This method ensures that grooves and holes of high aspect ratio are filled completely and uniformly. The process begins with the formation of connection holes and wiring grooves in a silicon oxide film on a silicon substrate. A TiN film is then applied over the entire surface of the semiconductor substrate, followed by a Ti film on regions excluding the connection holes and wiring grooves. The connection holes and wiring grooves are dipped in a plating solution, where a plating treatment occurs under specific deposition overvoltages. This technique allows for copper to fill the connection holes and wiring grooves effectively, resulting in uniform and well-filled copper wiring after polishing.

Career Highlights

Throughout his career, Tonomura has worked with notable companies, including Asahi Kasei Kogyo Kabushiki Kaisha and Asahi Kasei Corporation. His work has significantly impacted the semiconductor industry, particularly in enhancing the efficiency and reliability of semiconductor devices.

Collaborations

Tonomura has collaborated with esteemed colleagues such as Atsushi Aoshima and Hiroyuki Fukui. These partnerships have contributed to the development of innovative solutions in semiconductor technology.

Conclusion

Shoichiro Tonomura's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in the industry, ensuring the development of more efficient semiconductor devices.