Shoichiro Hidaka

Title: Innovations by Shoichiro Hidaka

Introduction

Shoichiro Hidaka is a notable inventor based in Koshi, Japan. He has made significant contributions to the field of substrate processing, holding a total of 3 patents. His work focuses on advanced methods and apparatuses that enhance substrate processing techniques.

Latest Patents

Hidaka's latest patents include a substrate processing method and a substrate processing apparatus. The substrate processing method involves forming a liquid film of an alkaline processing liquid on a substrate by supplying the alkaline processing liquid with a reduced oxygen concentration. This method also includes etching the substrate by rotating it while maintaining a liquid film of a specific thickness. The substrate processing apparatus features a substrate holder that holds a substrate with a concavo-convex pattern oriented upward. It includes a liquid supply unit that forms a liquid film in the concave portions of the pattern and a heating unit that uses a laser beam to heat the liquid film.

Career Highlights

Hidaka is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His innovative approaches have contributed to the advancement of substrate processing technologies, making significant impacts in the field.

Collaborations

Hidaka has worked alongside notable colleagues such as Boui Ikeda and Eiichi Sekimoto. Their collaborative efforts have furthered the development of cutting-edge technologies in substrate processing.

Conclusion

Shoichiro Hidaka's contributions to substrate processing through his patents and collaborations highlight his role as an influential inventor in the industry. His work continues to shape advancements in technology and processing methods.