Himeji, Japan

Shoichi Kitane


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1979

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1 patent (USPTO):Explore Patents

Title: The Innovations of Shoichi Kitane

Introduction

Shoichi Kitane is a notable inventor based in Himeji, Japan. He has made significant contributions to the field of semiconductor technology. His innovative methods have paved the way for advancements in the production of semiconductor devices.

Latest Patents

Kitane holds a patent for a method of producing semiconductor devices involving the use of silicon. This method includes removing all of the masking films used for forming desired semiconductor regions in the substrate. He then forms a new insulation film and selectively creates a second insulation film at predetermined portions using a silicon nitride film as the mask. This patent showcases his expertise and innovative approach in semiconductor manufacturing. He has 1 patent to his name.

Career Highlights

Shoichi Kitane is associated with Tokyo Shibaura Electric Co., Ltd., a company known for its advancements in electrical and electronic technologies. His work at this company has allowed him to contribute to various projects that enhance semiconductor production processes.

Collaborations

Throughout his career, Kitane has collaborated with esteemed colleagues such as Toshio Yonezawa and Hidekuni Ishida. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Shoichi Kitane's contributions to semiconductor technology through his innovative methods and collaborations highlight his importance in the field. His work continues to influence advancements in semiconductor device production.

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