This inventor holds 2 USPTO granted patents. Top assignee: Tokyo Ohka Kogyo Co., Ltd.. Active years: 2011-2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2011-2013
Title: Shoichi Fujita: Innovator in Resist Composition Technology
Introduction
Shoichi Fujita is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of resist composition technology, holding a total of 2 patents. His work focuses on developing advanced materials that enhance lithographic processes.
Latest Patents
Fujita's latest patents include a resist composition and a resist pattern forming method. The first patent presents a resist composition prepared by dissolving components in an organic solvent containing ethyl lactate. This innovative composition suppresses deterioration of sensitivity over time while maintaining essential lithographic characteristics. The method for forming a resist pattern is also outlined in this patent.
The second patent describes a positive resist composition for a thin-film implantation process. This composition includes a resin component with an acid-dissociable dissolution inhibiting group, which increases alkali solubility under acid action. It also features an acid generator that produces acid upon irradiation and a compound with radiation-absorbing ability. The resin component comprises structural units derived from hydroxystyrene, enhancing its functionality in lithographic applications.
Career Highlights
Shoichi Fujita is associated with Tokyo Ohka Kogyo Co., Ltd., a company known for its innovations in the semiconductor industry. His work has been instrumental in advancing resist technologies that are critical for modern manufacturing processes.
Collaborations
Fujita has collaborated with notable colleagues, including Kazuyuki Nitta and Tomoharu Takahashi. Their combined expertise has contributed to the development of cutting-edge resist compositions and methods.
Conclusion
Shoichi Fujita's contributions to resist composition technology have positioned him as a key figure in the field. His innovative patents reflect a commitment to enhancing lithographic processes, making a lasting impact on the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile