Shohei Nakamura

Title: Innovations of Shohei Nakamura

Introduction

Shohei Nakamura is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing, holding a total of 11 patents. His work focuses on developing advanced methods and apparatuses that enhance the efficiency of substrate processing.

Latest Patents

Nakamura's latest patents include a substrate processing method and a substrate processing apparatus. The substrate processing method involves forming a liquid film of a processing liquid containing at least one of sulfuric acid, a sulfate, peroxosulfuric acid, and a peroxosulfate, or a processing liquid containing hydrogen peroxide on a substrate. A plasma is then radiated to the liquid film, allowing for efficient substrate processing using the oxidizing power of the processing liquid. Additionally, his in-liquid plasma generation device includes a housing that holds a liquid in an internal space, a gas supply tube that discharges gas into the liquid, and electrodes that facilitate the generation of plasma within the liquid.

Career Highlights

Throughout his career, Nakamura has worked with notable companies such as Kyoto Pharmaceutical Industries, Ltd. and Sankyo Company, Limited. His experience in these organizations has contributed to his expertise in the field of substrate processing and innovation.

Collaborations

Nakamura has collaborated with several professionals in his field, including Hiroaki Shirahase and Shoji Kamiya. These collaborations have likely enriched his work and led to further advancements in his inventions.

Conclusion

Shohei Nakamura's innovative contributions to substrate processing demonstrate his commitment to advancing technology in this area. His patents reflect a deep understanding of the complexities involved in substrate treatment, positioning him as a key figure in the field.