Shohei Mimura

Title: Innovations of Shohei Mimura

Introduction

Shohei Mimura is a prominent inventor based in Joetsu, Japan. He has made significant contributions to the field of lithography through his innovative patents. With a total of 4 patents, his work focuses on advanced materials and methods used in photolithography.

Latest Patents

Mimura's latest patents include a phase shift mask blank and a manufacturing method for phase shift masks. His phase shift mask is designed to include a transparent substrate, an etching protection film, and a phase shift film that is compatible with ArF excimer laser exposure light. The etching protection film is composed of a material containing hafnium and oxygen or hafnium, silicon, and oxygen, with a thickness ranging from 1 to 30 nm and a transmittance of not less than 85% for the exposure light. The phase shift film is made from silicon and is free of hafnium, with a thickness of 50 to 90 nm. Additionally, he has developed a reflective mask blank for EUV lithography, which includes a substrate, a multilayer reflection film, and an absorber film containing tungsten and other materials.

Career Highlights

Mimura works at Shin-Etsu Chemical Co., Ltd., where he has been instrumental in advancing the company's technological capabilities. His expertise in materials science and engineering has led to the development of cutting-edge solutions in the semiconductor industry.

Collaborations

Mimura collaborates with talented coworkers such as Takuro Kosaka and Naoki Matsuhashi. Their combined efforts contribute to the innovative projects at Shin-Etsu Chemical Co., Ltd.

Conclusion

Shohei Mimura's contributions to the field of lithography through his patents demonstrate his commitment to innovation and excellence. His work continues to influence the semiconductor industry and pave the way for future advancements.