Fukuoka, Japan

Sho Iwai

This inventor holds 1 USPTO granted patent. Top assignee: Kyushu Institute of Technology. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sho Iwai. Retrieved from https://idiyas.com/inventor/sho-iwai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2018

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Sho Iwai: Innovator in Discharge Occurrence Evaluation Technology

Introduction

Sho Iwai is a notable inventor based in Fukuoka, Japan. He has made significant contributions to the field of electrostatic discharge testing. His innovative work focuses on evaluating the status of discharge or dielectric breakdown in test samples.

Latest Patents

Iwai holds a patent for a "Discharge occurrence status evaluation device and evaluation method." This invention evaluates the status of discharge or dielectric breakdown that occurs due to the application of impulse voltage or current to a test sample. The device utilizes an electrostatic discharge tester to measure radiation electromagnetic wave signals generated during the testing process. It effectively determines the timing and voltage of dielectric breakdown occurrences.

Career Highlights

Sho Iwai is affiliated with the Kyushu Institute of Technology, where he continues to advance research in his field. His work has implications for various applications in electronics and materials science.

Collaborations

Iwai has collaborated with notable colleagues, including Shinya Ohtsuka and Kotaro Tsuboi. Their combined expertise enhances the research and development efforts at the Kyushu Institute of Technology.

Conclusion

Sho Iwai's contributions to the evaluation of discharge occurrences represent a significant advancement in electrostatic discharge testing technology. His innovative patent and collaborative efforts continue to influence the field positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…