Bellevue, WA, United States of America

Shmuel Avidan


Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 2006-2009

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3 patents (USPTO):Explore Patents

Title: Shmuel Avidan: Innovator in Image Processing Technologies

Introduction

Shmuel Avidan is a notable inventor based in Bellevue, WA (US). He has made significant contributions to the field of image processing, particularly in the extraction of reflection and transparency layers from multiple images. With a total of 3 patents, Avidan's work has advanced the understanding and application of image layer extraction techniques.

Latest Patents

One of Avidan's latest patents is a system and method for extracting reflection and transparency layers from multiple images. This invention represents a scene as a group of image layers, including reflection and transparency layers. The method performs layer extraction from multiple images containing reflections and transparencies. It includes an optimal approach for recovering layer images and their associated motions from an arbitrary number of composite images. The invention also incorporates image formation equations, the constrained least squares technique for recovering component images, and a novel method for estimating upper and lower bounds on the solution using min- and max-composites, along with a motion refinement method.

Career Highlights

Shmuel Avidan is currently associated with Microsoft Technology Licensing, LLC, where he continues to innovate in the field of image processing. His work has garnered attention for its practical applications and technical depth.

Collaborations

Avidan has collaborated with notable figures in the field, including Richard S Szeliski and Padmanabhan Anandan. These collaborations have further enriched his research and contributions to image processing technologies.

Conclusion

Shmuel Avidan's innovative work in image processing, particularly in extracting reflection and transparency layers, showcases his expertise and commitment to advancing technology. His contributions continue to influence the field and inspire future innovations.

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