Shiyu Liu

Title: Shiyu Liu: Innovator in Extreme Ultraviolet Mask Absorber Materials

Introduction

Shiyu Liu is a prominent inventor based in Singapore, known for his significant contributions to the field of extreme ultraviolet (EUV) mask absorber materials. With a total of 10 patents to his name, Liu has made remarkable advancements in the manufacturing processes and materials used in EUV mask blanks.

Latest Patents

One of Liu's latest patents focuses on extreme ultraviolet mask absorber materials. This patent discloses EUV mask blanks that consist of a substrate, a multilayer stack of reflective layers on the substrate, a capping layer on the multilayer stack, and an absorber on the capping layer. The absorber is composed of a first layer selected from various materials, including Mo, Nb, V, and their alloys and oxides, as well as nitrides. Additionally, a second layer is chosen from materials such as TaSb, CSb, SbN, TaNi, TaCu, and TaRu. This innovative approach enhances the performance and efficiency of EUV mask blanks.

Career Highlights

Shiyu Liu is currently employed at Applied Materials, Inc., where he continues to push the boundaries of technology in the semiconductor industry. His work has been instrumental in developing advanced materials that are crucial for the production of high-performance semiconductor devices.

Collaborations

Liu collaborates with talented individuals in his field, including Vibhu Jindal and Shuwei Liu, who contribute to the innovative environment at Applied Materials, Inc. Their combined expertise fosters a culture of creativity and advancement in semiconductor technology.

Conclusion

Shiyu Liu's contributions to the field of extreme ultraviolet mask absorber materials exemplify the spirit of innovation and dedication to advancing technology. His work not only enhances the manufacturing processes but also plays a vital role in the future of semiconductor devices.