Company Filing History:
Years Active: 2005-2011
Title: Innovations by Shixue Han: A Leader in High Dielectric Materials and Metal Oxide Deposition Processes
Introduction: Shixue Han is a prominent inventor based in Milpitas, CA, with a remarkable portfolio that includes seven patents. His work is centered on advanced materials technology, specifically in the field of high dielectric constant materials and metal oxide deposition processes.
Latest Patents: Among his latest innovations, Han has developed a patent for "Surface pre-treatment for enhancement of nucleation of high dielectric constant materials." This invention provides a method for preparing surfaces to enhance the formation of thin films on substrates. It involves pre-cleaning the substrate, treating it with a hydroxylating agent, and forming a high dielectric layer. Another significant patent is the "ALD metal oxide deposition process using direct oxidation," which outlines a method for creating metal compounds like metal oxides or metal nitrides. The process uses a combination of metal organic compounds with ozone or radicals in a remote plasma chamber, resulting in improved uniformity of the deposited materials.
Career Highlights: Shixue Han's career has been marked by his contributions to innovative materials and processes at Applied Materials, Inc. His expertise in atomic layer deposition and surface treatments has placed him at the forefront of research in high-k dielectric materials, crucial for electronics and semiconductor applications.
Collaborations: Throughout his career, Han has collaborated with notable colleagues, including Craig Metzner and Shreyas Kher. These partnerships have fostered a collaborative environment that encourages innovation and the pursuit of groundbreaking technologies in the materials science field.
Conclusion: Shixue Han exemplifies the innovative spirit crucial to advancements in high dielectric materials and deposition techniques. With his extensive patent portfolio and collaborative efforts at Applied Materials, he continues to contribute significantly to the landscape of materials science, paving the way for future technological developments.