This inventor holds 1 USPTO granted patent. Top assignee: Advanced Material Solutions, LLC. Active years: 2021.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2021
Title: Innovations of Shiva Mandepudi in Radiation Shielding Technology.
Introduction
Shiva Mandepudi is an accomplished inventor based in San Ramon, CA (US). She has made significant contributions to the field of materials science, particularly in the area of radiation shielding for chemical vapor deposition (CVD) reactors. Her innovative approach has led to advancements that enhance the efficiency and safety of these reactors.
Latest Patents
Shiva Mandepudi holds a patent for her invention titled "Radiation shielding for a CVD reactor." This patent describes a reaction chamber that includes an enclosure coated with a metal nitride compound. This compound provides an average reflectivity to internal infra-red radiation of greater than 90%. The metal nitride can be titanium nitride, zirconium nitride, hafnium nitride, or a nitride of another metal, with a thickness ranging from 0.1 to 10 microns, preferably between 4 and 5 microns. The coating is designed to withstand high temperatures, up to at least 250°C, and can be applied using various deposition processes such as PVD, CVD, thermal spray, or cathodic arc.
Career Highlights
Shiva Mandepudi is currently employed at Advanced Material Solutions, LLC, where she continues to develop innovative materials and technologies. Her work focuses on enhancing the performance and safety of CVD reactors, which are critical in the semiconductor manufacturing process.
Collaborations
Shiva has collaborated with notable colleagues, including Jeffrey C Gum and Bryce E Clark, who have contributed to her research and development efforts.
Conclusion
Shiva Mandepudi's contributions to radiation shielding technology exemplify her innovative spirit and dedication to advancing materials science. Her patent reflects a significant step forward in improving the efficiency and safety of CVD reactors.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile