Shiu-Fang Lo

Title: Shiu-Fang Lo: Innovator in Semiconductor Manufacturing

Introduction

Shiu-Fang Lo is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent.

Latest Patents

Shiu-Fang Lo holds a patent for a manufacturing method of complementary metal oxide semiconductor. This method includes several steps, such as providing a semiconductor substrate and forming a metal oxide semiconductor region with an oxide layer exceeding 1 micrometer in thickness. The oxide layer serves as both an isolation region for the metal oxide semiconductor and a heat-isolation region for a poly heater. Additionally, the method involves forming a poly gate of the metal oxide semiconductor region, which is utilized as part of the poly heater, and optimizing the heat dissipation of the poly heater through a series of processes, including selenium etching.

Career Highlights

Shiu-Fang Lo is associated with Mosel Vitelic Corporation, where he has been instrumental in advancing semiconductor technologies. His work has not only contributed to the company's success but has also had a lasting impact on the industry.

Collaborations

Shiu-Fang Lo has collaborated with notable colleagues, including Chyan-Huei Wang and Jack Jan. Their combined expertise has fostered innovation and development within their projects.

Conclusion

Shiu-Fang Lo's contributions to semiconductor manufacturing exemplify the spirit of innovation in technology. His patent reflects a deep understanding of the complexities involved in semiconductor processes, showcasing his role as a key inventor in the field.