Darien, IL, United States of America

Shisheng Xiong

USPTO Granted Patents = 1 

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):

Introduction

Shisheng Xiong is an accomplished inventor based in Darien, IL, celebrated for his innovative contributions to the field of directed self-assembly (DSA) through his patent on atomic layer chemical patterns. His work focuses on enhancing the efficiency and resolution of assembly processes, which opens new avenues for research and application in nanotechnology.

Latest Patents

Xiong holds a significant patent titled "Atomic layer chemical patterns for block copolymer assembly." This invention details methods for directed self-assembly on atomic layer chemical patterns, particularly using two-dimensional materials like graphene. The high-resolution capabilities of these patterns can dramatically improve the effectiveness of block copolymer assembly, achieving up to ten times the resolution compared to traditional three-dimensional patterns. This development not only enhances assembly quality but also simplifies subsequent etching processes.

Career Highlights

Throughout his career, Shisheng Xiong has worked with prestigious institutions, notably the University of Chicago and the Wisconsin Alumni Research Foundation. His expertise in advanced material sciences and innovative fabrication techniques has positioned him as a notable figure in the field of polymer sciences.

Collaborations

In the course of his career, Xiong has collaborated with esteemed colleagues such as Paul Franklin Nealey and Tzu-Hsuan Chang. These partnerships have fostered a rich collaborative environment, contributing to significant advancements in their shared research interests.

Conclusion

Shisheng Xiong's contributions to the realm of atomic layer chemical patterns and directed self-assembly exemplify the innovative spirit necessary for advancements in technology. His pioneering patent not only signifies a personal achievement but also lays the groundwork for future developments in nanotechnology and materials science. As a respected inventor, Xiong continues to inspire future innovations through his work and collaborations.

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