This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2012.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2012
Title: Shishan Hu: Innovator in Cyclone Technology
Introduction
Shishan Hu is a notable inventor based in College Station, TX (US). He has made significant contributions to the field of cyclone technology, particularly with his innovative designs and methods.
Latest Patents
Shishan Hu holds a patent for a "Wetted wall cyclone system and methods." This invention features a cyclone body that includes an inlet end, an outlet end, an inner flow passage, and an inner surface defining an inner diameter. The design incorporates a cyclone inlet that is tangentially coupled to the cyclone body, which includes an inlet flow passage in fluid communication with the inner flow passage. Additionally, the wetted wall cyclone comprises a skimmer that extends coaxially through the outlet end of the cyclone body. The skimmer has an upstream end located within the cyclone body and a downstream end that is distal to the cyclone body, along with an inner exhaust passage in fluid communication with the inner flow passage. Furthermore, the design features a first annulus positioned radially between the upstream end and the cyclone body, with a radial width that ranges from 3% to 15% of the inner diameter of the cyclone body. Shishan Hu has 1 patent to his name.
Career Highlights
Throughout his career, Shishan Hu has demonstrated a commitment to advancing cyclone technology. His innovative approach has led to the development of efficient systems that enhance performance in various applications.
Collaborations
Shishan Hu has worked alongside Andrew R McFarland, contributing to the advancement of their shared projects and innovations.
Conclusion
Shishan Hu is a distinguished inventor whose work in cyclone technology has made a significant impact. His patented designs reflect his dedication to innovation and efficiency in engineering.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile