Kawasaki, Japan

Shiro Ozaki

This inventor holds 1 USPTO granted patent. Top assignee: Fujitsu Corporation. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shiro Ozaki. Retrieved from https://idiyas.com/inventor/shiro-ozaki-5aa6efpk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Shiro Ozaki: Innovator in Semiconductor Technology

Introduction

Shiro Ozaki is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent. His work focuses on enhancing the performance and reliability of semiconductor devices.

Latest Patents

Ozaki holds a patent for a semiconductor device and the manufacturing method associated with it. This invention features a copper wiring layer that is coated with a composition containing substances such as ammonia and organic bases. A silicon-containing insulating film is then superimposed on this copper wiring layer. This design allows for semiconductor devices that have insulating layers which adhere well to copper, improving the overall functionality of the devices.

Career Highlights

Shiro Ozaki is affiliated with Fujitsu Corporation, a leading technology company known for its advancements in computing and electronics. His role at Fujitsu has allowed him to work on cutting-edge technologies and contribute to the company's reputation for innovation.

Collaborations

Ozaki has collaborated with notable colleagues, including Yoshihiro Nakata and Yasushi Kobayashi. These partnerships have fostered a creative environment that encourages the development of new ideas and technologies in the semiconductor field.

Conclusion

Shiro Ozaki's contributions to semiconductor technology through his patent demonstrate his commitment to innovation. His work not only enhances the performance of semiconductor devices but also reflects the collaborative spirit of the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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