Kyoto, Japan

Shiro Okamura

This inventor holds 1 USPTO granted patent. Top assignee: Oji Seitai Kaisha, Ltd.. Active years: 1981.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shiro Okamura. Retrieved from https://idiyas.com/inventor/shiro-okamura-2s0oq119

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 1981

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1 patent (USPTO):Explore Patents

Title: Shiro Okamura: Innovator in Bag Printing Technology

Introduction: Shiro Okamura is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of printing technology, particularly in the method of printing on bags. His innovative approach has led to the development of a unique patent that enhances the quality and efficiency of bag printing.

Latest Patents: Okamura holds a patent for a "Method and apparatus for printing the surface of a bag." This invention involves a process where the air in a bag filled with content is first removed by pressing to flatten the surface. The bag is then transported in a manner that allows it to assume a fixed curvature, enabling the convex surface of the bag to align with the convex surface of a printing plate. This method ensures that the surface of the bag is printed clearly and effectively.

Career Highlights: Shiro Okamura is associated with Oji Seitai Kaisha, Ltd., where he has applied his expertise in printing technology. His work has been instrumental in advancing the capabilities of bag printing, making it more efficient and reliable.

Conclusion: Shiro Okamura's contributions to bag printing technology through his innovative patent demonstrate his commitment to enhancing industrial processes. His work continues to influence the printing industry, showcasing the importance of innovation in manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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