Beijing, China

Shiquan Lin

USPTO Granted Patents = 1 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Shiquan Lin: Innovator in Electrical Property Measurement

Introduction

Shiquan Lin is a notable inventor based in Beijing, China. He has made significant contributions to the field of electrical property measurement through his innovative methods and apparatus. His work is particularly relevant in the context of nanotechnology and materials science.

Latest Patents

Shiquan Lin holds a patent for a "Method and apparatus for measuring electrical properties of sample material, device and medium." This invention provides a method and apparatus for measuring an electrical property of a sample material. The method involves applying an alternating voltage to a piezoelectric ceramic, which causes a probe fixed on the ceramic to vibrate above the surface of the sample material. The invention measures a target contact potential difference between the probe and the sample material, as well as a target amplitude of an induced alternating current generated due to the probe's vibration. Ultimately, it determines the target work function of the surface of the sample material and the target charge density based on these measurements.

Career Highlights

Shiquan Lin is affiliated with the Beijing Institute of Nanoenergy and Nanosystems, where he continues to advance research in nanotechnology. His work has implications for various applications, including material characterization and electronic device development.

Collaborations

Shiquan Lin collaborates with Zhonglin Wang, a fellow researcher in the field. Their partnership enhances the research output and innovation potential within their institution.

Conclusion

Shiquan Lin's contributions to the measurement of electrical properties are significant in advancing the field of nanotechnology. His innovative methods and collaborative efforts continue to push the boundaries of research and development.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…